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The Growth Model of Atmospheric Contamination Film on a Chromium Surface as Revealed by Contact Angle and Mass-Spectroscopic Study of Photochemical Cleaning Processes

机译:接触角和质谱研究光化学清洗过程揭示的铬表面大气污染膜的生长模型

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摘要

Photochemical cleaning processed of atmospherically contaminated chromium surfaces have been examined by contact angles of water and by time-of-flight secondary ion mass spectroscopy. Exposure of the contaminated surfaces, where contact angles are uniform, to vacuum-ultraviolet radiation results in characteristic distribution of contact angles before all the portions of the plate surface become hydrophilic. The unclean region which has larger contact angle as compared to the averaged value on the plate shows larger intensity of carbon-containing fragments in the spectrum. In order to explain the apparent discrepancy in these results, a model is proposed in which alternate lateral and normal growth of atmospheric clusters occurs on the chromium surface.
机译:已通过水的接触角和飞行时间二次离子质谱法检查了对大气污染的铬表面进行的光化学清洁处理。在板表面的所有部分变为亲水性之前,接触角均匀的被污染表面暴露于真空紫外线辐射中会导致接触角的特征分布。与平板上的平均值相比具有更大接触角的不清洁区域在光谱中显示出更大的含碳碎片强度。为了解释这些结果的明显差异,提出了一个模型,其中在铬表面上出现了大气团簇交替的横向和正常生长。

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