首页> 外文会议>International Conference on Crystalline Silicon Photovoltaics >Unified lifetime metrology and photoluminescence imaging of passivation defects for silicon PV
【24h】

Unified lifetime metrology and photoluminescence imaging of passivation defects for silicon PV

机译:硅PV钝化缺陷的统一寿命计量和光致发光成像

获取原文

摘要

We have recently introduced an improved QSS-μPCD lifetime measurement with a strict quality of decay control technique. This enabled unified, parameter free determination of the decay lifetime and the steady-state lifetime over a broad steady-state injection range (up to about 30suns). Excellent correlation was found with Sinton QSSPC measurement. The advantage of spatially resolved μPCD was applied for wafer mapping. Emitter saturation current, J0, mapping was obtained directly from small perturbation decay lifetime using the Basore-Hansen procedure. The maps revealed commonly present passivation defects manifested as high J0 areas.In this work we report further improvement of the approach, especially regarding speed and resolution. Our research involved photoluminescence measurements on passivated test wafers in sequence with the QSS-μPCD unified lifetime measurement including J0. On selected sites the value of J0 was intentionally varied with corona charge induced field-effect. This enabled a unique PL calibration to J0 and other recombination parameters. Quantitative characteristics enabled us to compare PL procedures for the determination of J0 and to select a practical version for J0 imaging that uses direct J0 determination from the ratio of generation rate G to PL intensity. We have found that this J0 procedure correlates well with the commonly used Kane-Swanson method. In addition, it carries the practical advantages of needing only a single PL image with a straightforward calibration and relaxed requirements regarding injection range restriction.
机译:我们最近推出了一种改进的QSS-μPCD寿命测量,具有严格的衰变控制技术。这使得统一的统一参数可自由测定衰减寿命和稳态寿命在广泛的稳态注入范围内(最多约30sUN)。 SINTON QSSPC测量发现出色的相关性。施加了空间分离的μPCD的优点用于晶片映射。发射极饱和电流J0,使用群汉森程序直接从小扰动衰减寿命获得映射。地图揭示了常见的钝化缺陷表现为高J0区域。在这项工作中,我们报告了进一步改善了对方法,特别是关于速度和分辨率。我们的研究涉及通过QSS-μPCD统一寿命测量的钝化测试晶片上的光致发光测量,包括J0。在所选地点,J0的值与电晕电荷诱导的场效应有意地改变。这使得将唯一的PL校准和其他重组参数启用。定量特征使我们能够比较PL程序来确定J0,并为J0成像选择使用直接J0的实际版本,该实际版本从生成率G与PL强度的比率中确定。我们发现此J0程序与常用的KANE-Swanson方法相互关联。此外,它还具有仅需要单个PL图像的实际优点,其具有关于注射范围限制的直接校准和宽松要求。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号