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PHOTOLUMINESCENCE MAPPING OF PASSIVATION DEFECTS FOR SILICON PHOTOVOLTAICS

机译:硅光伏钝化缺陷的光致发光映射

摘要

Methods for fast and accurate mapping of passivation defects in a silicon wafer involve capturing of photoluminescence (PL) images while the wafer is moving, for instance, when the wafer is transported on a belt in a fabrication line. The methods can be applied to in-line diagnostics of silicon wafers in solar cell fabrication. Example embodiments include a procedure for obtaining the whole wafer images of passivation defects from a single image (map) of photoluminescence intensity, and can provide rapid feedback for process control.
机译:用于快速准确地映射硅晶片中的钝化缺陷的方法包括在晶片移动时捕获光致发光(PL)图像,例如,当晶片在生产线中的传送带上运输时。该方法可以应用于太阳能电池制造中的硅晶片的在线诊断。示例实施例包括用于从光致发光强度的单个图像(图)获得钝化缺陷的整个晶片图像的过程,并且可以提供快速反馈以进行过程控制。

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