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Influence of a-Si:H/ITO interface properties on performance of heterojunction solar cells

机译:A-Si:H / ITO接口属性对异质结太阳能电池性能的影响

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In this study, we focus on the influence of the contact properties between Indium Tin oxide (ITO) and hydrogenated amorphous Silicon (a-Si:H) on the performance of a-Si:H/c-Si Heterojunction (HJ) solar cells. We experimentally found that an increase of the (p) a-Si:H layer thickness can improve the open-circuit voltage (Voc) but also and especially the Fill-Factor (FF) of the cell. Thanks to simulation we propose an explanation of this unexpected increase. The deposition of ITO with low effective workfunction on (p) a-Si:H actually leads to a depletion of the emitter of the cell, which results in an increase of its effective activation energy and of its resistance affecting Voc and FF. Thanks to this new insight we give guidelines which can help to further optimize the HJ front stack.
机译:在这项研究中,我们专注于氧化铟锡(ITO)和氢化非晶硅(A-Si:H)之间的接触性能对A-Si:H / C-Si异质结(HJ)太阳能电池的性能影响。我们通过实验发现(P)A-Si:H层厚度的增加可以改善开路电压(VOC),而且可以提高电池的填充因子(FF)。由于模拟,我们提出了对这一意外增加的解释。在(P)A-Si:H上具有低有效工作功能的ITO沉积实际上导致细胞的发射极的消耗,这导致其有效的激活能量和其抗性影响VOC和FF的抗性导致增加。由于这种新的洞察力,我们提供了有助于进一步优化HJ Front Stack的指导方针。

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