Influence of hydrogen dilution on microstructure of μc-Si: H films

摘要

The influence of hydrogen dilution (D) on glass/stainless steel-based intrinsic amorphous/microcrystalline silicon thin film prepared was investigated by PECVD technology. The crystallization ratio and grain size of the silicon thin film at different hydrogen dilution is studied. The results reveal that the crystallization ratio and grain size of silicon thin film changed along with D. The crystallization ratio and grain size of the silicon thin film become larger when D is higher. However, the deposition rate is slow when the D value is too high. On this work, optimal μc-Si:H film can be obtained at D of about 98% in the suitable experimental conditions.