We report on the structure and optical properties of hydrogenated silicon thin films deposited by plasma -enhanced chemical vapor deposition (PECVD) from silane diluted with hydrogen in a wide dilution range. The samplesdeposited with dilutions below 30 were detected as amorphous hydrogenated silicon (a-Si:H) with crystalline grains ofseveral nanometers in size which represent the medium-range order of a-Si:H. The optical characterization confirmedincreasing ordering with the increasing dilution. The optical band gap was observed to be increasing function of the dilution.
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