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Effects of Annealing Temperature on Properties of CuIn (Se,S)_2 Film Prepared by Sputtering

机译:退火温度对溅射制备的Cuin(SE,S)_2膜性能的影响

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This paper examines CuIn(Se,S)_2 (CISS) films prepared by sputtering precursor films of In, Cu, and In_2S_3 onto Mo coated soda-lime glass, followed by a single-stage selenium annealing process to form a CISS chalcopyrite phase. In this study, S was substituted for Ga to increase the energy gap of CuInSe-based materials. Experimental results reveal that the composition of (S + Se) and S decreased slightly with an increase in the selenium annealing temperature, exhibiting uniform distribution throughout the entire CISS film sample. The resulting CISS film exhibited p-type conductivity with an energy gap of 1.11eV. The optimum selenium annealing condition for the CIGS precursor prepared by sputtering was 798 K for 20 minutes.
机译:本文研究了Cuin(SE,S)_2(CISS)通过溅射在Mo涂覆的钠钙玻璃上的前体薄膜制备的(CISS)薄膜,然后是单级硒退火方法形成CISS CHALCYLITE相。在该研究中,S被替代Ga以增加基于Cuinse的材料的能隙。实验结果表明,(S + SE)和S的组成略微下降,硒退火温度升高,在整个CISS膜样品中表现出均匀的分布。得到的CISS膜表现出p型导电性,其能隙为1.11ev。通过溅射制备的CIGS前体的最佳硒退火条件为798k 20分钟。

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