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Effects of annealing temperature on properties of CuIn (Se,S)2 film prepared by sputtering

机译:退火温度对溅射制备的CuIn(Se,S)2薄膜性能的影响

摘要

[[abstract]]This paper examines CuIn(Se,S)2 (CISS) films prepared by sputtering precursor films of In, Cu, and In2S3 onto Mo coated soda-lime glass, followed by a single-stage selenium annealing process to form a CISS chalcopyrite phase. In this study, S was substituted for Ga to increase the energy gap of CuInSe-based materials. Experimental results reveal that the composition of (S + Se) and S decreased slightly with an increase in the selenium annealing temperature, exhibiting uniform distribution throughout the entire CISS film sample. The resulting CISS film exhibited p-type conductivity with an energy gap of 1.11eV. The optimum selenium annealing condition for the CIGS precursor prepared by sputtering was 798 K for 20 minutes.
机译:[[摘要]]本文研究了CuIn(Se,S)2(CISS)膜,该膜是通过将In,Cu和In2S3的前体膜溅射到涂Mo的钠钙玻璃上,然后进行单阶段硒退火工艺形成的,从而制备的CISS黄铜矿相。在这项研究中,用S代替Ga可以增加CuInSe基材料的能隙。实验结果表明(S + Se)和S的组成随硒退火温度的升高而略有下降,在整个CISS膜样品中均呈现均匀分布。所得的CISS膜表现出具有1.11eV的能隙的p型导电性。通过溅射制备的CIGS前体的最佳硒退火条件是798 K,持续20分钟。

著录项

  • 作者

    Lin Yi- Cheng;

  • 作者单位
  • 年度 2012
  • 总页数
  • 原文格式 PDF
  • 正文语种 en
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