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Simulation of GaAs/Al_xGa_(1-x)As/In_yGa_(1-y)As Double-barrier Resonant Tunneling Structures

机译:GaAs / AL_XGA_(1-x)的模拟为/ in_yga_(1-y)作为双屏障谐振隧道结构

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We study the resonant tunneling in symmetric GaAs/Al_xGa_(1-x)As/In_yGa_(1-y)As double-barrier resonant-tunneling structures. Effects of three factors on the resonant tunneling are simulated and discussed. On increasing the barrier height, the decrease of current density is attributed to the interplay between the increase of the supply function of available electrons and the rapid decrease of the transmission coefficient through the device area, and the lowest Indium content for realizing the zero-bias resonant tunneling increases. With the increase of the barrier (well) width, the decrease of the current density can be explained by the fact that both the supply function and the transmission coefficient decreases, and the lowest Indium content meeting the zero-bias resonant condition decreases.
机译:我们在对称GaAs / AL_XGA_(1-x)中的谐振隧道作为/ in_yga_(1-y)作为双屏障谐振隧道结构。三种因素对谐振隧道的影响是模拟和讨论的。在增加屏障高度时,电流密度的降低归因于可用电子的供电功能的增加与通过器件区域的传输系数的快速降低之间的相互作用,以及用于实现零偏置的最低铟含量共振隧道增加。随着屏障(井)宽度的增加,电流密度的降低可以通过:供电功能和透射系数减小,并且满足零偏置谐振条件的最低铟内容降低。

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