The Effect of Magnetron Co-sputtering Parameters on the Microhardness of TiZrN Thin Films

摘要

TiZrN thin films have been prepared on high speed steel by using magnetron sputtering. Doping amounts of Zr were adjusted by changing the sputtering time of the Zr target. X-ray diffraction analyses show that TiZrN coatings consist of mixed crystals of TiN, TiZrN phases. The film microhardness first increases and then decreases with the increasing of Zr doping amount. With the same Zr doping amount, the microhardness of the samples will improve with the increasing of doping times.