Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers

摘要

Nanocolumnar titanium zirconium nitride (TiZrN) films deposited on silicon wafer substrates were fabricated via reactive magnetron co-sputtering with oblique angle deposition (OAD) at room temperature. The influences of the sputtering power of Zr target varied from 100 to 300 W, on the structure, morphology and composition of the nanocolumnar TiZrN film were investigated by gracing-incidence X-ray diffraction (GIXRD), field emission scanning electron microscope (FE-SEM), transmission electron microscope (TEM), energy dispersive X-ray spectroscopy (EDS), atomic force microscope (AFM) and photoelectron spectroscopy (PES). The GIXRD patterns revealed that the prepared films deposited at different sputtering powers of Zr target were crystalline in cubic phase with preferential orientation (111) and (222) planes of ZrN and TiN, respectively. The morphology obtained from FE-SEM showed well aligned slanted nanocolumnar structure, which come from the OAD technique. Increasing the sputtering power of Zr target, led to high adatom energy and enhanced collision effect during film deposition which the nanocolumnar showed obvious change in the diameter, length and tilt angle. The EDS mapping inside the nanocolumnar confirmed the homogeneity of the Ti, Zr and N element distributed in the nanocolumnar TiZrN films. Finally, the tribology behavior was preliminarily investigated based on the hardness of the nanocolumnar film and discussed in this manuscript.