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Atomic Layer Deposition (ALD) to Mitigate Corrosion and Tin Whisker Issues of Printed Circuit Board Assemblies

机译:原子层沉积(ALD),以减轻印刷电路板组件的腐蚀和锡晶须问题

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Picosun is undertaking a research programme, funded by ESA's European Component Initiative (ECI) Phase 4 and Strategic Initiative (StrIn) programmes, in collaboration with Oy Poltronic Ab and Loughborough University, to evaluate atomic layer deposition (ALD) conformal coatings as a method of mitigating the growth of tin whiskers. The work is investigating the effect of ALD coating process variables on the ability of the coating to prevent whisker growth. Scanning electron microscopy and optical methods have been used to evaluate both the size and distribution of tin whiskers and the coating/whisker interactions. In this paper we will present some of the most interesting initial results from this study. ALD shows promising results as a barrier to whisker growth and our future work will continue on fine-tuning the process and ALD recipes. ALD coatings have been used for a long time as a method of corrosion protection in many industrial and commercial applications. As such they represent an interesting option for the protection of assembled electronic circuit boards and modules when extremely thin, practically massless, re-workable, transparent and inert coatings are needed, especially in certain high-end applications.
机译:PicoSun正在通过ESA的欧洲组成倡议(ECI)第4阶段和战略倡议(Strin)计划为与Oy Poltronic Ab和Loughborough大学合作进行资助的研究计划,以评估原子层沉积(ALD)共形涂层作为一种方法减轻锡须的生长。该作品正在研究ALD涂层工艺变量对涂层以防止晶须生长的能力的影响。扫描电子显微镜和光学方法已被用于评估锡晶须和涂层/晶须相互作用的尺寸和分布。在本文中,我们将介绍这项研究的一些最有趣的初始结果。 ALD显示有希望的结果作为晶须增长的障碍,我们未来的工作将继续进行微调过程和ALD食谱。在许多工业和商业应用中,ALD涂层已经使用了很长时间作为一种腐蚀保护方法。因此,当需要极薄,实际上是无麻环的,重新合适的,透明和惰性涂层时,它们代表了一种有趣的选择,可以在需要极薄,实际上是无线的,重新工作,透明和惰性涂层时,特别是在某些高端应用中。

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