首页> 外文会议>e-Manufacturing Design Collaboration Symposium >Blind contact detection in the irregularly periphery area using leap scan e-beam inspection
【24h】

Blind contact detection in the irregularly periphery area using leap scan e-beam inspection

机译:使用LEAP&SCAN E-BEACH检查在不规则的外围区域中盲接触检测

获取原文

摘要

• Key Technology for Invisible Defects Detection: Electron beam inspection (EBI) system using the Leap & Scan mode with external electric field is a key technology for root cause analysis of invisible defects. • Issues in Continuous Inspection Mode : Continuous inspection mode suffers serious misalignment and low voltage contrast issues, it is hard to inspect the irregularly periphery area. • Choose the Right Inspection Mode: Leap & Scan mode with external electric field have good alignment performance and significant voltage contrast differences. It has higher sensitivity to verify the voltage contrast difference both in array and periphery. • Effective Inspection in Irregularly Periphery Area: External electron filed suppresses the surface charging, and extracts the electrons to surface then enhancing the voltage contrast among the contact plugs. The blind contact plugs in the irregularly periphery area can be monitored effectively under this optimized e-beam inspection condition.
机译:•无形缺陷检测的关键技术:电子束检测(EBI)系统使用带有外部电场的LEAP和扫描模式是一种用于无形缺陷的根本原因分析的关键技术。 •连续检查模式下的问题:连续检查模式遭受严重的错位和低压对比问题,很难检查不规则的周边区域。 •选择正确的检查模式:带外部电场的LEAP和扫描模式具有良好的对准性能和显着的电压对比度差异。它具有更高的灵敏度来验证阵列和外围中的电压对比度差异。 •在不规则的外围区域中有效检查:外部电子孔抑制表面充电,并提取电子到表面,然后提高接触插头之间的电压对比度。在该优化的电子束检测条件下,可以有效地监测不规则外围区域中的盲接触插头。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号