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Effects of substrate temperature on the properties of Cu(In,Ga)Se_2 thin films prepared by sputtering from a quaternary target

机译:基质温度对季靶溅射制备的Cu(河内)SE_2 SE_2薄膜性能的影响

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Cu(In,Ga)Se_2 (CIGS) thin films were prepared by direct magnetron sputtering CIGS quaternary target at the substrate temperature varying from room temperature (RT) to 300 °C. The effects of substrate temperature on the structural and electrical properties of CIGS films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) and Hall effect measurement. The CIGS thin films with a chalcopyrite structure were obtained between 100 and 300 °C and the crystallinity of films were enhanced with the increase of the substrate temperature from 100 to 300 °C. The film compositions were consisted with the target when the substrate temperatures were between RT and 200 °C, however, it deviated from the stoichiometry of the target when the substrate temperature was 300 °C. The CIGS films deposited at 200 °C had the higher carrier mobility of 3.522 cm~2/Vs.
机译:通过在从室温(RT)至300℃的基板温度下,通过直接磁控溅射CIGS季靶制备Cu(in,Ga)Se_2(CIGS)薄膜。 X射线衍射(XRD),扫描电子显微镜(SEM),能量分散X射线(EDX)和霍尔效应测量,表征了基材温度对CIGS膜的结构和电性能的影响。在100至300℃之间获得具有核偶结构的CIG薄膜,并随着底物温度的增加,从100至300℃的增加而增强薄膜的结晶度。然而,当基板温度在室温和200℃之间时,薄膜组合物将终点组成,当衬底温度为300℃时,它偏离了靶的化学计量。沉积在200℃时的CIG膜具有3.522cm〜2 / vs的载体迁移率高。

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