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首页> 外文期刊>Journal of materials science >Cu(In,Ga)Se_2 films prepared by sputtering with a chalcopyrite Cu(In,Ga)Se_2 quaternary alloy and In targets
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Cu(In,Ga)Se_2 films prepared by sputtering with a chalcopyrite Cu(In,Ga)Se_2 quaternary alloy and In targets

机译:黄铜矿Cu(In,Ga)Se_2四元合金和In靶​​溅射制备Cu(In,Ga)Se_2薄膜

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摘要

This study reports the successful preparation of Cu(In,Ga)Se_2 (CIGS) thin film solar cells by magnetron sputtering with a chalcopyrite CIGS quaternary alloy target. Bi-layer Mo films were deposited onto soda lime glass. A CIGS quaternary alloy target was used in combination with a stack indium target for compensating the loss of indium during annealing process. A one-stage annealing process was performed to form CIGS chalcopyrite phase. Experimental results show that the optimal adhesion strength, residual stress, and resistivity were obtained at a thickness ratio of 67% of bi-layer Mo films and a working pressure of 0.13 Pa. The CIGS precursor was layered through selenization at 798 K for 20 min. The stoichiom-etry ratios of the CIGS film were Cu/(In + Ga) = 0.91 and Ga/(In + Ga) = 0.23, which approached the device-quality stoichiometry ratio (Cu/(In + Ga) <0.95, and Ga/(In + Ga) <0.3). The resistivity of the sample was 11.8 Qcm, with a carrier concentration of 3.6 × 10~(17) cm~(-3) and mobility of 1.45 cm~2V~(-1)s~(-1). The resulting film exhibited p-type conductivity.
机译:这项研究报告了用黄铜矿CIGS四元合金靶磁控溅射成功制备了Cu(In,Ga)Se_2(CIGS)薄膜太阳能电池。将双层Mo膜沉积到钠钙玻璃上。 CIGS四元合金靶材与堆叠式铟靶材结合使用,以补偿退火过程中铟的损失。进行一级退火工艺以形成CIGS黄铜矿相。实验结果表明,在双层Mo膜厚度为67%,工作压力为0.13 Pa的条件下,可以获得最佳的粘接强度,残余应力和电阻率。在798 K下硒化20 min即可制得CIGS前驱体。 。 CIGS膜的化学计量比为Cu /(In + Ga)= 0.91和Ga /(In + Ga)= 0.23,接近器件质量化学计量比(Cu /(In + Ga)<0.95),并且Ga /(In + Ga)<0.3)。样品的电阻率为11.8 Qcm,载流子浓度为3.6×10〜(17)cm〜(-3),迁移率为1.45 cm〜2V〜(-1)s〜(-1)。所得膜表现出p型导电性。

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  • 来源
    《Journal of materials science》 |2012年第2期|p.493-500|共8页
  • 作者单位

    Department of Mechatronics Engineering, National Changhua University of Education, Changhua 50007, Taiwan;

    Department of Mechatronics Engineering, National Changhua University of Education, Changhua 50007, Taiwan;

    Department of Mechatronics Engineering, National Changhua University of Education, Changhua 50007, Taiwan;

    Department of Mechatronics Engineering, National Changhua University of Education, Changhua 50007, Taiwan;

    Williams Advanced Materials Technologies Taiwan Co., Ltd,Taoyuan 33857, Taiwan;

    Williams Advanced Materials Technologies Taiwan Co., Ltd,Taoyuan 33857, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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