首页> 外文会议>International Conference on Materials Science and Engineering Technology >Cu(In, Ga)Se_2 Films Deposited by Sputtering with Single Cu(In, Ga)Se_2 and Cu-Ga-In_2Se_3 Targets and a Subsequent Selenization Procedure
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Cu(In, Ga)Se_2 Films Deposited by Sputtering with Single Cu(In, Ga)Se_2 and Cu-Ga-In_2Se_3 Targets and a Subsequent Selenization Procedure

机译:通过用单铜(In,Ga)Se_2和Cu-Ga-In_2Se_3靶溅射沉积Cu(族,Ga)Se_2膜和随后的硒化程序

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Cu(In, Ga)Se_2 (CIGSe) thin films were prepared by sputtering with single CIGSe or Cu-Ga-In_2Se_3 target and subsequent selenization at 550-700°C. The one- and two-step selenization procedures and the ceramic and cermet targets were used for process comparisons. Microstructure, film growth and film composition were used to evaluate the growth performance. CIGSe films sputtered from the CIGSe target had a low Cu content. CIGSe films prepared with single Cu-Ga-In_2Se_3 target had shown different performance after the one- and two-step selenization procedures. The two-step process did not grow the dense films due to the vaporization of Se-containing species from the incomplete reaction. The high-temperature requirement is the major disadvantage for the post-selenization approach.
机译:通过用单个缩合或Cu-Ga-In_2Se_3靶溅射并随后在550-700℃下溅射来制备Cu(In,Ga)Se_2(CIGSE)薄膜。单步硒化程序和陶瓷和金属陶瓷靶标用于工艺比较。使用微观结构,薄膜生长和薄膜组合物来评估生长性能。从CIGSE目标溅射的CIGSE薄膜具有低CU内容。用单铜GA-IN_2SE_3目标准备的缩减薄膜在单步和两步硒化程序后显示出不同的性能。由于不完全反应的含Se的物种蒸发,两步过程不会长大致密膜。高温要求是硒化方法的主要缺点。

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