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Effects of Boron and Nitrogen Contents on the Microstructures and Mechanical Properties of Cr-B-N Nanocomposite Thin Films

机译:硼和氮含量对Cr-B-N纳米复合薄膜微观结构和力学性能的影响

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摘要

Two series of Cr-B-N nanocomposite thin films with various nitrogen and boron contents were deposited by a co-sputtering process using a bipolar asymmetric pulsed DC reactive magnetron sputtering system, respectively. The crystalline structures and BN bonding nature of thin films were characterized by X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FTIR), respectively. The cross sectional morphologies of thin films were examined by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The nanoindentation technique was used to evaluate the hardness and elastic modulus of thin films. The hardness, elastic modulus and H/E ratio increased with increasing nitrogen content, and decreased with increasing boron content. The optimal mechanical properties were achieved on the Cr-3.7 at.% B-54.6 at.% N thin film with a very fine and dense columnar structure.
机译:使用双极不对称脉冲DC反应磁控溅射系统分别通过共溅射工艺沉积具有各种氮和硼含量的两种Cr-B-N纳米复合薄膜。薄膜的结晶结构和BN键合性质分别是通过X射线衍射(XRD)和傅里叶变换红外光谱(FTIR)的特征。通过扫描电子显微镜(SEM)和透射电子显微镜(TEM)检查薄膜的横截面形态。纳米狭窄技术用于评估薄膜的硬度和弹性模量。随着氮含量的增加,硬度,弹性模量和H / E比增加,随着硼含量的增加而降低。在Cr-3.7 at attyha.%b-54.6℃下实现最佳的机械性能。%n薄膜,具有非常细致的柱状结构。

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