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Microstructure and Oxidation Resistance of Y Modified Silicide Coatings Prepared on Zr-Ti-AI Alloy

机译:Y改性硅化物涂层对ZR-Ti-Ai合金制备的微观结构和抗氧化性能

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Zr-20Ti-5A1 (at. %) alloy used as substrates for Si-Y_2O_3 co-deposition experiments was prepared by firstly vacuum non-consumable arc melting and then high frequency induction skull melting. The results showed that Y modified silicide coating prepared at 1250 °C for 4 h possessed a double-layer structure, mainly consisting of a thick (Zr, Ti)Si_2 outer layer and a 15 μm thick (Zr, Ti)Si inner layer. Meanwhile, the growth rate of ZrSi_2 phase changed with temperature, while the growth rate of ZrSi did not vary significantly with temperature. The growth of the coating as well as the two layers followed parabolic laws, and the co-deposition process was controlled by diffusion. ZrSi_2 was not appropriate as oxidation-resistant coatings to protect Nb based alloy from oxidation due to the lack of the formation of good quality glassy SiO_2 layer in the scale.
机译:用作Si-Y_2O_3共沉积实验的基材的ZR-20TI-5A1(AT.%)合金通过首先真空非耗材电弧熔化,然后高频感应颅骨熔化制备。结果表明,在1250℃下制备的Y改性硅化物涂层4小时具有双层结构,主要由厚(Zr,Ti)Si_2外层和15μm厚(Zr,Ti)Si内层组成。同时,ZrSI_2相的生长速率随温度而变化,而ZRSI的生长速率与温度没有显着变化。涂层的生长以及两层呈抛物线法,并通过扩散控制共沉积过程。 Zrsi_2不适用于抗氧化涂层,以保护基于Nb的合金免受氧化,由于缺乏尺寸缺乏良好的玻璃状SiO_2层的形成。

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