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Photoelectrochemical Study of AgInS_2 Thin Films Prepared Using Sulfurization of Evaporated Metal Precursors

机译:使用蒸发金属前体制备的Agins_2薄膜的光电化学研究

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The AgInS_2 polycrystalline films were grow n on glass substrates by using sulfurization of evaporated metal precursors. New procedures for the growth of AgInS_2 films are presented.. The influences of [Ag]/[In] molar ratio in the precursor films on structural, optical, electrical performances of films have been investigated. The X-ray diffraction patterns of the samples demonstrate the presence of polycrystalline structures of AgInS_2 phase in these films. The band gaps and carrier densities of these samples determined from transmittance spectra and electrochemical analysis are in the range of 1.92-4.94 eV, and 3.2x10~(20)~4.0x10~(20) cm~3, respectively. The flat band potentials of these samples are located between -0.83 and -1.10 V versus normal hydrogen electrode with the Mott-Schottky measurements. The maximum photocurrent density of samples prepared in this study with external potential kept at +1.0 V (vs. Ag/AgCl electrode) was found to be 4.4 mA/cm~2 under the illumination with white light intensity kept at 100 mW/cm~2.
机译:通过使用蒸发的金属前体的硫化,agins_2多晶膜在玻璃基板上生长n。提出了agins_2薄膜的生长的新程序。研究了[Ag] / [In]摩尔比对在结构,光学,电气性能的前体膜中的影响。样品的X射线衍射图案证明了这些薄膜中的agins_2相的多晶结构存在。从透射谱和电化学分析确定的这些样品的带间隙和载体密度在1.92-4.94eV的范围内,分别为3.2x10〜(20)〜4.0x10〜(20)cm〜3。这些样品的扁平带电位位于-0.83和-1.10V之间,而具有Mott-Schottky测量的正常氢电极。在该研究中制备的样品的最大光电流密度与外部电位保持在+1.0V(Vs.Ag / AgCl电极)下,在照明下为4.4mA / cm〜2,白色光强度保持在100mW / cm〜 2。

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