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The difference between microstructures and optical properties of Pb_(1-x)Ge_xTe thin films evaporated using electron beam and resistance heating respectively

机译:使用电子束和电阻加热蒸发PB_(1-X)GE_XTE薄膜的微结构和光学性质的差异

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Lead germanium telluride (Pb_(1-x)Ge_xTe), a pseudo-binary alloy of IV-VI narrow gap semiconductors PbTe and GeTe, is considered a potential mechanically robust high-index coating material. Pb_(1-x)Ge_xTe thin films were evaporated on silicon substrates from the ingots of single crystals using electron beam and resistance heating, respectively. The surface topographies and compositions of thin-films were characterized by using scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDX); the transmission spectra in a spectral range of 2.5~12 μm were also examined. Thin films demonstrated columnar microstructure; moreover, those evaporated using e-beam heating have much larger granular dimensions, in comparison with those using resistance heating. The measurement of transmittance reveals the advantage of perfect stoichiometry in e-beam evaporated thin films fails to improve optical properties. It can be deduced the scattering from the larger grains may impair the optical transparency. It can be concluded that electron beam evaporation is an optimum deposition choice.
机译:铅锗碲化锗(PB_(1-X)GE_XTE),IV-VI窄间隙半导体PBTE和Gete的伪二进制合金被认为是潜在的机械稳健的高折射率涂层材料。使用电子束和电阻加热,在从单晶的锭料上蒸发PB_(1-X)GE_XTE薄膜。通过使用扫描电子显微镜(SEM)和能量分散X射线分析(EDX),表征薄膜的表面拓扑和组合物;还检查了光谱范围内的透射光谱。薄膜显示柱状微观结构;此外,与使用电阻加热的人相比,使用电子束加热蒸发的那些具有更大的粒度。透射率的测量揭示了E-束蒸发的薄膜中完美化学计量的优点,不能改善光学性质。它可以推导出较大的谷物的散射可能会损害光学透明度。可以得出结论,电子束蒸发是最佳沉积选择。

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