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Effect of vacancy defects on thermal conductivity of silicon nanowire: A molecular dynamics study

机译:空位缺陷对硅纳米线热导率的影响:分子动力学研究

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Reducing the thermal conductivity of silicon nanowires (SiNWs) can enhance the thermoelectric figure of merit. Applying non-equilibrium molecular dynamics (NEMD) simulation, it has been demonstrated that the thermal conductivity of SiNWs is approximately two orders of magnitude lower than bulk silicon crystal and that it can be reduced remarkably by including vacancy defects. It has been found that "surface vacancy defect" reduces thermal conductance much more than "center vacancy defect". The thermal conductivity reaches the minimum, which is about 17% of that of pristine SiNW, when 2% surface vacancy defect is introduced in the nanowire. In order to reveal the origin of this drastic reduction of thermal conductivity, the vibrational density of states (VDOS) analysis is performed and it has been found that due to the high surface to volume ratio, the various boundary inelastic scatterings of phonon reduce thermal conductivity significantly. Also, larger mass difference due to voids induces smaller thermal conductivity values. These results indicate that the inclusion of vacancy defects offers an available way for improving the thermoelectric performance of silicon nanowires.
机译:降低硅纳米线(SINW)的导热率可以增强热电值的优点。施加非平衡分子动力学(NEMD)模拟,已经证明SINWS的导热率大约比散装硅晶体低大约两个数量级,并且可以通过包括空位缺陷显着降低。已经发现“表面空位缺陷”降低了远远超过“中心空位缺陷”的热敏。当在纳米线中引入2%表面空位缺陷时,导热率达到最初的原始Sinw的约17%。为了揭示导热率的这种急剧降低的起源,所以进行状态的振动密度(VDOS)分析,并且已经发现由于高度的高度比率,声子的各种边界非弹性散射降低了导热系数显着地。而且,由于空隙引起的较大质量差异诱导较小的导热率值。这些结果表明,包含空位缺陷提供了一种用于提高硅纳米线的热电性能的可用方法。

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