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Investigation of the Photoelectric Characteristics of ZnO Nanowires on AZO Thin Film

机译:Zno薄膜ZnO纳米线光电特性研究

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This experiment applied the vapor transport method and the AZO catalyst, and successfully grew ZnO nanowires on silicon substrate. The results showed that the factors such as the position of growth substrate, temperature, temperature rising rate, growth time, gas flow volume, and the proportion of ZnO and carbon composition powder, could decide the quality and characteristics of ZnO nanowire. Optimal conditions for ZnO nanowire growth were: carbon and ZnO powders mixed at a 1:1 weight ratio to serve as the material for growing nanowires, located at a distance of 10 cm from the silicon substrate which already had AZO thin film deposed on it; the growth temperature was set at 1100°C for a continuous duration of 70 minutes; the flow volumes of the nitrogen and oxygen gases within the furnace pipe were 70 and 60 sccm, and the furnace pipe temperature rising rate was 20°C/min. In addition, it was observed by FE-SEM that when the substrate was away from the source material by 10 cm, there was nanowire with the radius of 0.11 μm and length of 9.3μm. By X-ray we found the characteristic wave summit of ZnO with lattice parameter a = 0.3249 nm and c = 0.5206 nm, was in fine single crystal structure and the directions were all in (002). In field emission measurements, when the current densities was 0.1 μA/cm2, the lower initial electric fields corresponding to it was 0.11 V/μm and had the best field enhancement factor with a value of 1782.
机译:该实验施加了蒸汽传输方法和偶氮催化剂,并在硅衬底上成功增长了ZnO纳米线。结果表明,生长衬底,温度,温度上升率,生长时间,气体流量和ZnO和碳组合粉比例等因素可以决定ZnO纳米线的质量和特征。 ZnO纳米线生长的最佳条件是:碳和ZnO粉末在1:1的重量比下混合,用作生长纳米线的材料,位于距离硅衬底10cm的距离,该距离已经具有偶氮薄膜的硅基衬底。将生长温度设定在1100℃,连续持续时间为70分钟;炉管内的氮气和氧气的流量为70和60sccm,炉管温度上升速率为20℃/ min。另外,通过Fe-SEM观察,当基材远离源材料10cm时,纳米线的半径为0.11μm,长度为9.3μm。通过X射线我们发现ZnO的特征波峰与晶格参数A = 0.3249nm,C = 0.5206nm,处于精细的单晶结构,并且方向都在(002)中。在现场发射测量中,当电流密度为0.1μA/ cm 2时,对应于其对应的初始电场为0.11V /μm,并且具有值为1782的最佳场增强因子。

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