Fabrication of Adaptive Mirrors for Extreme Ultraviolet Lithography - (PPT)

机译：适用于极端紫外线光刻的自适应镜的制造 - （PPT）

获取原文

页面导航

摘要
著录项
相似文献
相关主题

摘要

Reasonable smoothness is obtained before any polishing step; To be done: Patterning electrodes, polishing, multilayer mirror deposition and testing; Reflectance tuning is limited by the maximum strain of the piezoelectric films; Smooth piezo. Films can be fabricated; Shorter wavelengths will be explored.

机译：在任何抛光步骤之前获得合理的平滑度;要完成：图案化电极，抛光，多层镜沉积和测试;反射率调谐受压电薄膜的最大应变的限制;光滑的压电。薄膜可以制造;将探索更短的波长。

著录项

来源
《International Symposium on Extreme Ultraviolet Lithography》|2012年||共1页
会议地点
作者
Muharrem Bayraktar; Anuj Chopra; Werner A. Wessels; Chris J. Lee; Fred A. van Goor; Gertjan Koster; Guus Rijnders; Fred Bijkerk;
展开▼
作者单位

展开▼
会议组织
原文格式 PDF
正文语种
中图分类 TN305.7-53;
关键词

相似文献

外文文献
中文文献
专利

1. Fabrication of Mo/Si multilayer mirrors for extreme ultraviolet lithography by means of superconducting bulk magnet magnetron sputtering [J] . Mizutani U, Yamaguchi T, Ikuta H, Physica, C. Superconductivity and its applications . 2008,第15a20期

机译：通过超导块磁控管溅射制备用于极端紫外光刻的Mo / Si多层反射镜
2. Inhibition of carbon growth and removal of carbon deposits on extreme ultraviolet lithography mirrors by extreme ultraviolet irradiation in the presence of water, oxygen, or oxygen/ozone mixtures [J] . Masahito Niibe, Keigo Koida, Yukinobu Kakutani Journal of Vacuum Science & Technology . 2011,第1期

机译：在水，氧气或氧气/臭氧混合物的存在下通过极紫外辐射抑制碳生长并去除极紫外光刻镜上的碳沉积物
3. Nonlinear Behavior of Decrease in Reflectivity of Multilayer Mirrors for Extreme Ultraviolet Lithography Optics by High-Flux Extreme Ultraviolet Irradiation in Various Vacuum Environments [J] . Masahito Niibe, Keigo Koida, Yukinobu Kakutani, Japanese journal of applied physics . 2011,第6Issue2期

机译：在不同真空环境下，高通量极紫外光照射下，极紫外光刻光学多层反射镜反射率的非线性行为
4. Fabrication of Adaptive Mirrors for Extreme Ultraviolet Lithography - (PPT) [C] . Muharrem Bayraktar, Anuj Chopra, Werner A. Wessels, International Symposium on Extreme Ultraviolet Lithography . 2012

机译：适用于极端紫外线光刻的自适应镜的制造 - （PPT）
5. Intense capillary discharge plasma extreme-ultraviolet sources for extreme-ultraviolet lithography and other extreme-ultraviolet imaging applications. [D] . Klosner, Marc Alexander. 1998

机译：强烈的毛细管放电等离子体极紫外光源，用于极紫外光刻和其他极紫外成像应用。
6. Fabrication of multi-layer polymeric micro-sieve having narrow slot pores with conventional ultraviolet-lithography and micro-fabrication techniques [O] . Majid Ebrahimi Warkiani, Chao-Ping Lou, Hai-Qing Gong 2011

机译：用常规的紫外光刻和微细加工技术制备具有窄缝孔的多层聚合物微筛
7. Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography [O] . Habets, Michel, Scholten, Joni, Weiland, Siep, 2016

机译：多镜自适应光学器件，用于控制极端紫外光刻中的热像差
8. Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Micro-Field Exposure Tool (MET). Conference: SPIE - Extreme Ultraviolet (EUV) Lithography V, San Jose, CA, February 23, 2014; Related Information: Journal.Publication Date: 90481M. [R] . Cummings, K., Ashworth, D., Bremer, M., 2014

机译：更新sEmaTECH 0.5 Na极紫外光刻（EUVL）微场曝光工具（mET）。会议：spIE - 极紫外（EUV）光刻V，加利福尼亚州圣何塞，2014年2月23日;相关信息：Journal.publication日期：90481m。

Fabrication of Adaptive Mirrors for Extreme Ultraviolet Lithography - (PPT)

摘要

著录项

相似文献

相关主题

期刊订阅