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EUVL multilayer mirror oxidation modeling - (PPT)

机译:EUVL多层镜氧化建模 - (PPT)

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Oxidation is one major cause which degrades the reflectivity of the multilayer mirrors used for optics of EUV exposure tools. To estimate the change of reflectivity due to oxidation, modeling of the multilayer mirror oxidation was becoming greater importance. Bajt, et al experimentally evaluated the oxidation of the EUV multilayer mirrors with Ru cap using ALS at Lawrence Berkeley National Laboratory [1]. They compared the oxidation of EUV multilayer mirror cased by electron beam irradiation and EUV irraditation [2] Klebanoff, et al proposed the mitigation of oxidation by use of the ethanol [3]. Hollenshead and Klebanoff modeled EUV/H_2O oxidation of Ru coatings [4]. They detailed the oxidation of Ru coatings causing by H_2O. We have modeled the oxidation of the EUV multilayer mirror based on these prior studies. We have evaluated EUVL multilayer mirror oxidation model comparing its prediction with experimental data.
机译:氧化是降低用于EUV曝光工具光学光学器件的多层镜的反射率的一个主要原因。为了估算由于氧化引起的反射率的变化,多层镜氧化的建模变得更加重要。 Bajt等,通过在Lawrence Berkeley National实验室的ALS使用ALS进行了实验评估了EUV多层镜的氧化与Ru Cap [1]。它们比较了通过电子束照射和EUV辐射壳的EUV多层镜的氧化[2] Klebanoff,等,提出了通过使用乙醇的氧化[3]。 Hollenshead和Klebanoff模型EUV / H_2O氧化Ru涂层[4]。他们详细介绍了由H_2O引起的Ru涂层的氧化。我们根据这些先前的研究建模了EUV多层镜的氧化。我们评估了EUVL多层镜氧化模型,比较了其对实验数据的预测。

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