Reflector of the multi-layer structure for EUVL, and a method of manufacturing a reflector of EUVL for multilayer structure

摘要

Boron carbide in alternating layers of Si and Mo (for example, B 4 _C) thermal stability is used in extreme ultraviolet region and the soft X-ray, and reflectance Mo / Si of (molybdenum / silicon) multilayer film of is enhanced by the deposition of a thin layer. This is useful in multi-layer mask in a thermally stable than the Mo / Si multilayer and pure coating multilayer reflective coating in extreme ultraviolet light and soft X-ray, in the mask, in other wavelengths.