Implementing E-beam Correction Strategies for Compensation of EUVL Mask Non-flatness - (PPT)

机译：实现EUVL面罩非平整度补偿的电子束校正策略 - （PPT）

获取原文

页面导航

摘要
著录项
相似文献
相关主题

摘要

Non-flatness compensation is a key enabler for EUV lithography. SEMATECH and partners demonstrated for the first time that non-flatness correction work. Flatness compensation should have a major impact on mask cost enables relaxed flatness standards - easier to meet defect requirements (flatness/defectivity trade-off).

机译：非平整度补偿是EUV光刻的关键推动器。 SEMATECH和合作伙伴首次展示了非平坦的校正工作。平整度补偿应对面罩的重大影响是掩模成本，使放松的平坦度标准 - 更容易满足缺陷要求（平整度/缺陷折衷）。

著录项

来源
《International Symposium on Extreme Ultraviolet Lithography》|2011年||共20页
会议地点
作者
J. Sohn; K. Orvek; R. Engelstad; P. Vukkadala; S. Yoshitake; S. Raghunathan; T. Laursen; J. Zimmerman; B. Connolly; J. H. Peters;
展开▼
作者单位

展开▼
会议组织
原文格式 PDF
正文语种
中图分类 TN305.7-53;
关键词

相似文献

外文文献
中文文献
专利

1. Modelling strategies for the incorporation and correction of optical effects in EUVL [J] . Piyush Pathak, Qiliang Yan, Thomas Schmoeller, Microelectronic Engineering . 2009,第4a6期

机译：在EUVL中合并和校正光学效应的建模策略
2. Inspection of EUVL mask blank defects and patterned masks using EUV photoemission electron microscopy [J] . Jingquan Lin, J. Maul, N. Weber, Microelectronic Engineering . 2008,第5a6期

机译：使用EUV光发射电子显微镜检查EUVL掩模的空白缺陷和图案化掩模
3. Implementation of E-Beam Proximity Effect Correction using linear programming techniques for the fabrication of asymmetric bow-tie antennas [J] . Filiz Yesilkoy, Kwangsik Choi, Mario Dagenais, Solid-State Electronics . 2010,第10期

机译：使用线性编程技术制造非对称领结天线的电子束邻近效应校正
4. Implementing E-beam Correction Strategies for Compensation of EUVL Mask Non-flatness - (PPT) [C] . J. Sohn, K. Orvek, R. Engelstad, International Symposium on Extreme Ultraviolet Lithography . 2011

机译：实现EUVL面罩非平整度补偿的电子束校正策略 - （PPT）
5. Correction strategies to compensate for image placement errors induced during EUVL mask chucking. [D] . Vukkadala, Pradeep. 2010

机译：校正策略以补偿在EUVL掩模卡盘过程中引起的图像放置错误。
6. Implementation of an Elastomeric Mask Program as a Strategy to Eliminate Disposable N95 Mask Use and Resterilization: Results from a Large Academic Medical Center [O] . Sricharan Chalikonda, Hope Waltenbaugh, Sara Angelilli, -1

机译：作为消除一次性N95掩模使用和resterilization的策略实施弹性体掩模计划：大学医学中心的结果
7. A color compensation method for a projector considering non-flatness of color screen and mean lightness of the projected image [O] . Soo-Jin Sung, Cheol-Hee Lee 2010

机译：考虑彩屏非平坦度的投影仪颜色补偿方法和投影图像的平均亮度
8. Performance of Actinic EUVL Mask Imaging using a Zoneplate Microscope. [R] . Han, H. S., Anderson, E. H., Kemp, C. D., 2007

机译：使用Zoneplate显微镜进行光化EUVL掩模成像的性能。

Implementing E-beam Correction Strategies for Compensation of EUVL Mask Non-flatness - (PPT)

摘要

著录项

相似文献

相关主题

期刊订阅