Development Status of Canon's EUVL Exposure Tool - (PPT)

机译：佳能EUVL曝光工具的发展状况 - （PPT）

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Fabrication technologies for projection optics; Surface figuring technologies satisfy requirements for HVM tool. At-wavelength multilayer evaluation system for thickness and phase measurements has been developed. Optics lifetime. Atomic hydrogen cleaning method has advantage of low damage and reasonable etching rate. Optics Design. Optical design of 6-mirror High-NA projection optics has been completed.

机译：投影光学制造技术;表面图测证技术满足HVM工具的要求。已经开发出用于厚度和相位测量的波长多层评估系统。光学寿命。原子氢清洁方法具有低损坏和合理的蚀刻速率的优点。光学设计。 6镜高NA投影光学器件的光学设计已完成。

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《International Symposium on Extreme Ultraviolet Lithography》|2011年||共17页
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Akira Miyake; Takayuki Hasegawa; Hiroyuki Kubo; Shigeyuki Uzawa;
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中图分类 TN305.7-53;
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4. Development Status of Canon's EUVL Exposure Tool - (PPT) [C] . Akira Miyake, Takayuki Hasegawa, Hiroyuki Kubo, International Symposium on Extreme Ultraviolet Lithography . 2011

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Development Status of Canon's EUVL Exposure Tool - (PPT)

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