Enhanced field emission from graphene foam treated by H2 plasma etching

摘要

The Graphene has attracted great attention in recent years because of its outstanding materials characteristics and promising technological applications. Previous studies have extensively investigated graphene sheets lying flat on substrates. However, vertically aligned graphene structure on substrates has been lacking but possesses unique potential application in field emission devices, in which plenty of exposed edge planes exists, providing a high density of field emission sites. However, more work need to be done to achieve excellent graphene field emitters with a low turn-on field and threshold field, large enhancement factor, and good stability, including the reliable fabrication of large-scale graphene film.