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Large Scale Carbon Coating on Cohesive Particles by a Chemical Vapour Deposition Process in a Fluidized Bed Reactor

机译:通过化学气相沉积过程在流化床反应器中的大型碳涂层

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The coating of particles by very thin functional carbonaceous layers in the range of a few nanometers is a very helpful tool when it comes to the development of conductive or antistatic and transparent paints/coatings. In order to meet the requirements of the commercial production on a large scale of homogenously carbon coated particles, an efficient coating process and a suitable reactor design have to be developed. Thin carbon layers of a thickness of about 2 to 5 nm are obtained on the surface of the particles by conducting a Chemical Vapour Deposition (CVD) process at elevated temperatures starting from 500 °C. Precursors of different carbon content, e. g. acetone and 3-methyl-2-butin-2-ol were used in the CVD process and their influence on the final carbon coating concerning conductivity was investigated. Furthermore the deposition time of the carbon precursors was varied in order to achieve different quantities of carbon deposited on the particle surface. The resulting carbon content obtained by the CVD process was determined by thermo gravimetric analysis (TGA). In order to study the influence of the carbon coating on the electrical conductivity of the particles the specific resistance of the bulk material consisting of the carbon coated particles was measured as well. As the carbon content on the particle surface increases to 1,5 weight percent, the specific resistance decreases dramatically from about 50 Mficm for the uncoated material to nearly 60 Qcm for the carbon coated material. RAMAN spectroscopy measurements of the carbon layers which have been deposited on top of the particle surface reveal a nanocrystalline graphite (nc) structure. Transmission electron microscopy (TEM) images show a homogenous coating of every single particle; the layer thickness ranges from 3 to 5 nm.
机译:当涉及导电或抗静电和透明涂料/涂层的开发时,在几纳米的范围内通过非常薄的功能性碳质层涂覆颗粒的涂覆是非常有用的工具。为了满足大规模均匀碳涂覆颗粒的商业生产要求,必须开发有效的涂布方法和合适的反应器设计。通过在从500℃开始的升高的温度下进行化学气相沉积(CVD)工艺,在颗粒表面上获得厚度为约2至5nm的薄碳层。不同碳含量的前体,E。 G。在CVD工艺中使用丙酮和3-甲基-2-丁蛋白-2-醇,并研究了对关于导电性的最终碳涂层的影响。此外,碳前体的沉积时间变化以实现沉积在颗粒表面上的不同量的碳。通过CVD工艺获得的所得碳含量通过热重量分析(TGA)测定。为了研究碳涂层对颗粒的电导率的影响,也测量由碳涂覆颗粒组成的散装材料的特异性。随着颗粒表面上的碳含量增加到1.5重量%,电阻从约50mFIM用于未涂覆的材料急剧下降至碳涂覆材料的接近60 QCM。已沉积在颗粒表面顶部的碳层的拉曼光谱测量显示纳米晶石墨(NC)结构。透射电子显微镜(TEM)图像显示每种颗粒的均匀涂层;层厚度范围为3至5 nm。

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