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A 32kb 90nm 9T-cell sub-threshold SRAM with improved read and write SNM

机译:具有改进的读写SNM的32kb 90nm 9t-cell子阈值SRAM

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The fast growth of battery operated devices has made low power SRAM designs a necessity in recent years. Moreover, embedded SRAM units have become an important block in modern SoCs. The SRAM performance is limited by the cell stability during different operation. By adding extra transistor to the conventional 6T-cell, hold, read and write static noise margin (SNM) can be improved in the sub-threshold SRAM. In this paper we proposed a new 9T-cell SRAM that shows 80% and 50% improvement in read and write SNM respectively in comparison to the conventional 6T-cell SRAM. Using stack transistors in the leakage current path, the new structure shows lower bitline leakage assisting the sense amplifier to easily read the bitline current. The 0.3V sub-threshold SRAM post-layout simulation using 90nm TSMC CMOS model confirms the proposed 32k SRAM performance.
机译:电池供电器件的快速增长使得近年来低功率SRAM设计了必要性。此外,嵌入式SRAM单元已成为现代SoC的重要块。 SRAM性能受到不同操作期间的细胞稳定性的限制。通过将额外的晶体管添加到传统的6T单元,可以在子阈值SRAM中提高保持,读取和写入静态噪声余量(SNM)。在本文中,我们提出了一种新的9T-Cell SRAM,分别与传统的6T-Cell SRAM相比,分别显示读写SNM的80%和50%的改善。在漏电流路径中使用堆栈晶体管,新结构显示较低的位线泄漏,辅助感测放大器可以轻松读取位线电流。使用90nm TSMC CMOS模型的0.3V子阈值SRAM后布局仿真确认了所提出的32K SRAM性能。

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