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A 32kb 90nm 9T-cell sub-threshold SRAM with improved read and write SNM

机译:具有改进的读写SNM的32kb 90nm 9T单元亚阈值SRAM

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摘要

The fast growth of battery operated devices has made low power SRAM designs a necessity in recent years. Moreover, embedded SRAM units have become an important block in modern SoCs. The SRAM performance is limited by the cell stability during different operation. By adding extra transistor to the conventional 6T-cell, hold, read and write static noise margin (SNM) can be improved in the sub-threshold SRAM. In this paper we proposed a new 9T-cell SRAM that shows 80% and 50% improvement in read and write SNM respectively in comparison to the conventional 6T-cell SRAM. Using stack transistors in the leakage current path, the new structure shows lower bitline leakage assisting the sense amplifier to easily read the bitline current. The 0.3V sub-threshold SRAM post-layout simulation using 90nm TSMC CMOS model confirms the proposed 32k SRAM performance.
机译:电池驱动设备的快速增长使得近年来低功耗SRAM设计成为必要。此外,嵌入式SRAM单元已成为现代SoC中的重要模块。 SRAM性能受到不同操作期间单元稳定性的限制。通过向传统的6T单元添加额外的晶体管,可以改善亚阈值SRAM中的保持,读取和写入静态噪声容限(SNM)。在本文中,我们提出了一种新的9T单元SRAM,与传统的6T单元SRAM相比,其SNM读写性能分别提高了80%和50%。新结构在泄漏电流路径中使用堆叠晶体管,显示出更低的位线泄漏,有助于读出放大器轻松读取位线电流。使用90nm TSMC CMOS模型进行的0.3V亚阈值SRAM后布局仿真证实了建议的32k SRAM性能。

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