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Investigation of PVD DLC Thin Films Manufactured using HIPIMS Etch/Unbalanced Magnetron Sputter (UBM) Deposition and Secondary Mechano-Chemical Modification

机译:使用HIPIMS蚀刻/不平衡磁控溅射(UBM)沉积和次级机械化学改性制造的PVD DLC薄膜的研究

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PVD Diamond-like-carbon (DLC) coatings find increasing industrial acceptance in automotive, aerospace and medical applications due to reduced friction and low wear coefficient. Very recently, High Power Impulse Magnetron Sputter (HIPIMS) sources have been shown to produce fluxes with very high metal ion fraction similar to that produced by arc evaporation sources, without showing excessive heating and droplet formation characteristics. These new source properties now enable industrial scale low temperature, low roughness and high efficiency etching of the substrate prior to deposition to deliver enhanced adhesion. We report on the properties and performance of HIPIMS etched titanium containing DLC (Me-DLC) and metal free (graphite based) C-DLC films deposited at temperature below 160°C. Prior to deposition, the coating-substrate interface was engineered using high substrate bias voltage closed field unbalanced magnetron enhanced Ar etch followed by metal ion etch using a single Cr HIPIMS source. The mechanical, tribological and physical properties of the coatings have been investigated using XTEM, dynamic micro-hardness, Scratch and Rockwell-C Adhesion, Raman microscopy and pin-on-disc tribological testing. 3.5μm as-deposited Me-DLC films showed hardness around 1000 HV, friction coefficient 0.15 and excellent adhesion (LC1~60N, LC2>140N). 2.5μm thick as-deposited C-DLC coatings exhibited significantly increased hardness to 3400 HV, extremely low friction coefficient (0.06), a shift in phase composition to high sp3 percentage, whilst maintaining very good adhesion following HIPIMS etch. XSTEM & EDX analysis across the coating-substrate interface showed distinct modification of the substrate through the use of a HIPIMS source. After deposition, selected Me-DLC coatings have been treated by secondary surface modification using a novel mechano-chemical method. SEM and nano-indentation investigations established that by applying mechano-chemical processing it is possible to change the microstructure of Me-DLC coating, increases hardness and decrease surface roughness without compromising friction or adhesion behavior. In particular a significant change in the film morphology has been observed and as a result the hardness of the films may be increased by up to 40%.
机译:PVD类金刚石碳(DLC)涂层找到由于减少了摩擦和低磨损系数增加汽车,航空航天和医疗应用的工业接受。最近,高功率脉冲磁控溅射(HIPIMS)来源已经被证明产生的磁通与相似于电弧蒸发源产生的非常高的金属离子部分,而不显示过度加热和液滴形成特性。这些新的源属性现在使工业规模低温,低粗糙度和高效率的沉积以提供增强的粘附之前的基板的蚀刻。我们对性能报告和HIPIMS的性能蚀刻含有DLC(ME-DLC)钛和金属自由沉积在低于160℃的温度(基于石墨的)C-DLC膜。前沉积,涂层 - 基底界面使用高衬底偏压闭合场非平衡磁控增强的Ar蚀刻,然后使用单一的Cr HIPIMS源通过金属离子蚀刻工程。涂层的机械,摩擦学和物理性质已经使用XTEM,动态微硬度,耐擦伤和Rockwell-C粘附,拉曼显微镜和销 - 盘摩擦测试调查。 3.5μm如此沉积的ME-DLC膜显示的硬度大约1000 HV,摩擦系数在0.15和优良的粘合性(LC1〜60N,LC2> 140N)。 2.5μm的厚沉积C-DLC涂层表现出硬度显著增加至3400 HV,极低的摩擦系数(0.06),在相组合物中以高的sp 3百分比的移位,同时保持以下HIPIMS非常好的粘附性蚀刻。 XSTEM&EDX穿过涂层 - 基材界面的分析通过使用HIPIMS源的显示基板的不同修改。沉积之后,选择ME-DLC涂层已经通过使用一种新颖的机械化学方法二次表面改性处理。 SEM和纳米压痕调查确定,通过施加机械化学处理,可以改变我-DLC涂层,增加硬度和减小表面粗糙度的组织而不损害摩擦或粘附行为。特别是在薄膜形态的显著变化已经观察到,其结果薄膜的硬度可以增加高达40%。

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