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MOVPE growth and investigation of AIInN/AIN multiple quantum wells

机译:MOVPE生长和调查AIINN / AIN多量子阱

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We report about the MOVPE growth and characterisation of A1_(0.90)In_(0.10)N single layers and multiple quantum well structures (MQW) containing 8 periods of A1_(0.90)In_(0.10)N/AIN quantum wells. All samples show good quality in high-resolution X-ray diffractometry (HRXRD) evaluation, superlattice fringes up to the 2~(nd) order can be seen for the MQW sample. In optical transmission experiments, an absorption edge for the A1_(0.90)In_(0.10)Nsingle layer is detected at 4.9 eV. Due to the low intensity of emission and limited sensitivity of our setup in this spectral region, photoluminescence (PL) emission above 4 eV is only visible for the MQW sample. Both PL and cathodoluminescence (CL) measurements show an emission peak at longer wavelength for the Al_(0.90)In_(0.10)N/AIN MQW sample. When increasing the excitation current density in CL, the emission at lower wavelength is clearly enhanced, while it is slightly reduced at higher wavelength. We believe this to be a saturation effect of a defect-related emission.
机译:我们报告了A1_(0.90)IN_(0.10)IN_(0.10)单层和多量子阱结构(MQW)的MOVPE生长和表征,其中包含8个A1_(0.90)IN_(0.10)N / AIN量子孔的8周期。所有样品在高分辨率X射线衍射术(HRXRD)评估中显示出质量良好的质量,可以看到高达2〜(ND)顺序的超晶格,用于MQW样品。在光学传输实验中,在4.9eV下检测A1_(0.90)IN_(0.10)in_(0.10)Nsingle层的吸收边缘。由于在该光谱区域中的设置的发射强度和有限的灵敏度强度,仅在4eV上以上的光致发光(PL)发射仅适用于MQW样本。 PL和阴极致发光(CL)测量均显示出较长波长的发射峰,用于AL_(0.90)IN_(0.10)N / AIN MQW样品。当增加CL中的激励电流密度时,较低波长的发射清晰地显着增强,而在较高波长下略微降低。我们认为这是缺陷相关排放的饱和效果。

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