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Electrical Characterization of Diamond-Like Carbon Films Synthesized by Plasma Enhanced CVD Technique

机译:等离子体增强CVD技术合成的金刚石状碳膜的电气表征

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Diamond-like carbon (DLC) films have been deposited on silicon substrates using microwave plasma enhanced chemical vapor deposition (PE-CVD) process of CH_4 in H_2 gas mixture. The well-faceted good quality DLC film with distinct diamond Raman spectroscopic characteristics are found at low CH_4 concentration. Schottky barrier diode (SBD) structures are fabricated onto the grown DLC films using Ti/Au and Al as ohmic and rectifying contacts, respectively. The responses of DLC-SBD to DC and time varying signals have been studied. The frequency dependent response results are compared to models, which includes as input parameters the depletion and bulk regions resistances and capacitances trap effects, and SBD parameters of which extracted from the DC I-V characteristics. It is found that the frequency dependent properties of DLC-SBD can be associated with deep trap states inside the DLC material rather than with only the SBD geometrical structure.
机译:使用微波等离子体增强的化学气相沉积(PE-CVD)在H_2气体混合物中沉积金刚晶碳(DLC)薄膜在硅基上沉积。刻面优质的高质量DLC薄膜,具有不同的金刚石拉曼光谱特性,在低CH_4浓度下发现。使用Ti / Au和Al作为欧姆和整流触点,将肖特基势垒二极管(SBD)结构分别制造在生长的DLC膜上。研究了DLC-SBD对DC和时间变化信号的响应。将频率依赖性响应结果与模型进行比较,其包括作为输入参数的耗尽和散装区域电阻和电容陷阱效应,以及从DC I-V特性提取的SBD参数。发现DLC-SBD的频率相关性能可以与DLC材料内的深阱状态相关联,而不是仅具有SBD几何结构。

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