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Nanowire Quantum Effects in Trigate SOI MOSFETs

机译:Trige SOI MOSFET中的纳米线量子效应

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摘要

This paper describes low-dimensional nanowire quantum effects that occur in small trigate SOI MOSFETs. 2D numerical simulation is used to calculate the electron concentration profile as a function of gate voltage in devices with different cross sections. The smaller the section, the higher the threshold voltage. A dynamic increase of threshold voltage with electron concentration is observed. Inter-subband scattering causes oscillations of the transconductance when measured as a function of the gate voltage. These oscillations are visible at low temperature (< 30K) in samples with a 45 × 82nm cross section and at room temperature in devices with a 11nm × 48nm cross section.
机译:本文介绍了在小纹理SOI MOSFET中发生的低维纳米线量子效应。 2D数值模拟用于计算电子浓度轮廓作为具有不同横截面的装置中的栅极电压的函数。截面越小,阈值电压越高。观察到具有电子浓度的阈值电压的动态增加。当作为栅极电压的函数测量时,子带间散射导致跨导的振荡。这些振荡在具有45×82nm横截面的样品中的低温(<30k),在具有11nm×48nm横截面的器件中的室温下可见。

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