Design and fabrication of 2-DOF silicon micromirror with sloped electrodes

摘要

We report on the design, fabrication and experiment of a 2-DOF silicon scanning micromirror. We propose sloped electrodes to increase a maximum scan angle with a simple fabrication process. A delayed electroplating technique is adopted to fabricate the sloped profile of the electrodes over the patterned seed layer. We fabricated the 2-DOF scanning mirror which has different type of electrodes beneath each axis and compared with parallel plate electrodes. Experiment results show sloped electrodes increase stable range up to 62.1% and decreases actuation voltage down to 65.4% from parallel plate electrodes.