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Study on Ferroelectric Properties of Nd-Doped Bi_4Ti_3O_(12) Thin Films Prepared by Sol-Gel Method

机译:溶胶 - 凝胶法制备的Nd掺杂Bi_4Ti_3O_(12)薄膜的铁电性能研究

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Nd-doped bismuth titanate Bi_(4-x)Nd_xTi_3O_(12) (BNT) thin films were fabricated on Pt/Ti/SiO_2/Si substrates by sol-gel method and spin-coating technique. The structures and the ferroelectric properties of the films were investigated. Nd doping leads to a marked improvement in the remanent polarization (P_R) and the coercive field (E_c). At the applied electric field of 260 kV/cm, P_R and E_C of the BNT film with x=0.5 annealed at 650 deg C are 19 mu C/cm~2 and 135 kV/cm, respectively. Moreover, the BNT film with x=0.5 showed a fatiguefree behavior up to 3 X 10~(10) read/write cycles.
机译:通过溶胶 - 凝胶法和旋涂技术在Pt / Ti / SiO_2 / Si衬底上制造了Nd掺杂的钛酸铋Bi_(4-x)Nd_xti_3O_(12)(BNT)薄膜。研究了薄膜的结构和铁电性能。 ND掺杂导致倒置极化(P_R)和矫顽磁场(E_C)的显着改善。在260kV / cm的施加电场,BNT膜的P_R和E_C,X = 0.5在650℃下退火分别为19μC/ cm〜2和135kV / cm。此外,具有X = 0.5的BNT膜显示出高达3×10〜(10)读/写循环的疲劳无缺行为。

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