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Study on Ferroelectric Properties of Nd-Doped Bi_4Ti_3O_(12) Thin Films Prepared by Sol-Gel Method

机译:溶胶凝胶法制备掺钕Bi_4Ti_3O_(12)薄膜的铁电性能研究

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摘要

Nd-doped bismuth titanate Bi_(4-x)Nd_xTi_3O_(12)(BNT) thin films were fabricated on Pt/Ti/SiO_2/Si substrates by sol-gel method and spin-coating technique. The structures and the ferroelectric properties of the films were investigated. Nd doping leads to a marked improvement in the remanent polarization (P_r) and the coercive field (E_c). At the applied electric field of 260 kV/cm, P_r and E_c of the BNT film with x=0.5 annealed at 650℃ are 19 μC/cm~2 and 135 kV/cm, respectively. Moreover, the BNT film with x=0.5 showed a fatiguefree behavior up to 3x10~(10) read/write cycles.
机译:通过溶胶-凝胶法和旋涂技术在Pt / Ti / SiO_2 / Si衬底上制备了掺钕钛酸铋Bi_(4-x)Nd_xTi_3O_(12)(BNT)薄膜。研究了薄膜的结构和铁电性能。 Nd掺杂可显着改善剩余极化(P_r)和矫顽场(E_c)。在260 kV / cm的施加电场下,在650℃退火的x = 0.5的BNT薄膜的P_r和E_c分别为19μC/ cm〜2和135 kV / cm。此外,x = 0.5的BNT膜在3x10〜(10)个读/写周期内表现出无疲劳性能。

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