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Bulk and Interface Charging Mechanisms in Organic Semiconductor-Gate Dielectric Bilayers

机译:有机半导体栅极电介质双层的批量和接口充电机制

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Since the first reports of charge storage in the gate dielectrics of organic semiconductors, several groups have proposed charge-storing dielectrics that become polarized through varied mechanisms, and have offered various explanations for observed charge storage phenomena. These groups were concerned either with nonvolatile memories as an application, or with controlling hysteresis in conventional OFETs. This manuscript describes measurements of surface charging and OFET threshold voltage shift for a case where charge is clearly stored in the dielectric. The magnitude and stability of the charge storage depend on the hydrophobicity of the dielectric and the charge deposition process. We focus on SiO_2 as the dielectric and use a thiophene oligomer or hexadecafluoro-copper phthalocyanine as semiconductor. In one case, the phthalocyanine was inverted from electron- to hole-carrying, enabling a complementary device to be made from a single semiconductor.
机译:由于有机半导体的栅极电介质中的第一电荷存储报告,因此已经提出了通过各种机制偏振的电荷存储的电介质,并且为观察到的电荷存储现象提供了各种解释。这些组涉及非易失性存储器作为应用,或者在传统的常规中控制滞后。该稿件描述了表面充电的测量和FONET阈值电压移位,其电荷清楚地存储在电介质中。电荷存储器的幅度和稳定性取决于电介质和电荷沉积过程的疏水性。我们专注于SiO_2作为电介质,并使用噻吩低聚物或十六氟氟 - 铜酞菁作为半导体。在一种情况下,将酞菁从电子到孔中倒转,使得可以由单个半导体制成的互补装置。

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