Application of modified Jog-fill DRC rule on LFD OPC flow

摘要

The methodology of lithography friendly design (LFD) has been widely adopted since it dramatically reduces cycle of design revision as well as number of learning cycles to reach acceptable yield. LFD is, for example, the reduction number of small jogs and notches in original, pre-OPC layouts We can call them as OPC-unfiiendly patterns since they create unnecessarily complicated OPC patterns, They usually meet design rule so that DRC does not detect or screen them out. Also, they make many errors after OPC because OPC model recognizes just as one of small features that it should care. This generates many false alarms at OPC verification and mask rule check.