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Structural Characterization of the Growth Front of 4H-SiC Boules Grown Using the Physical Vapor Transport Growth Method

机译:使用物理蒸汽输送生长方法生长的4H-SiC槽的生长正面的结构表征

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The defect structure at the growth front of 4H-SiC boules grown using the physical vapor transport (PVT) method has been investigated using high resolution x-ray diffraction and x-ray topography. The crystal parameters such as the c-lattice constant exhibited characteristic variations across the growth front, which appeared to be caused by variation in surface morphology of the as-grown surface of the boules rather than the defect structure underneath the surface. X-ray topography also revealed that basal plane dislocations are hardly nucleated at the growth front during PVT growth of 4H-SiC crystals.
机译:使用高分辨率X射线衍射和X射线地形研究了使用物理蒸汽传输(PVT)方法生长的4H-SiC槽的生长前面的缺陷结构。诸如C-晶格常数的晶体参数在增长前面表现出特征变化,这似乎是由槽的生长表面的表面形态的变化引起的,而不是表面下方的缺陷结构。 X射线地形还显示,在4H-SiC晶体的PVT生长期间,基础平面脱位几乎不会在生长前核。

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