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Lead Free Assembly Qualification of ALIVH Boards

机译:无铅议会委员会委员会

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The migration to lead free reflow is bringing many challenges for the PCB industry. High Tg laminates, stability of materials thru 2X reflows, rework, moisture sensitivity etc. This requires careful evaluation of new laminate materials, balancing component layout and optimization of reflow profiles to minimize damage to PWBs. This is critical for thin PWBs (less than 0.1 mm) boards used in cell phones and other portable products that use build up microvia technologies.The trends of increased functionality and reduced size of portable wireless products, such as handsets; PDAs are demanding increased routing densities for printed circuit boards. The handheld wireless product market place demands products that are small, thin, low-cost and lightweight and improved user interfaces. In addition, the convergence of handheld wireless phones with palmtop computers and Internet appliances is accelerating the need for functional circuits designed with smallest, low-cost technology. Historically, the industry has met this challenge through high density interconnect technology and increased silicon integration and component miniaturization. Microvia high density interconnect (HDI) also known as build up technology, is one method for constructing circuit boards with high routing density demands. [1].For HDI board, vias can be formed using unreinforced dielectric such as Resin Coated Foil (RCF), using processing techniques such as laser drilling or photoimaging. The vias are then metallized using electroless copper/electrolytic plating. The advantage of the HDI construction is the ability to create smaller vias (6 mils) and via pad sizes. This enables higher routing density, lower metal count, reduced board area and increased functionality as compared to conventional boards. HDI improves the wiring density by using build up microvias in the outer layers. However there is still dead space where components cannot be mounted and lines cannot be wired, because of staggered via hole structure. On the other hand, ALIVH-G (Any Layer Interstitial via Hole) needs no through hole. This is because any two layers are electrically connected by IVH (Interstitial Via Hole). The IVH can be placed in any position. Since mere is no through hole that disturbs interconnections between components, the dead space becomes reduced and the wiring capability is improved greatly. [2] Past board technologies used stacked microvias on the outer layers. Current board designs use ALIVH-G technology. These vias are laser drilled and the interconnection technology used is conductive copper paste. The typical design rule is Lines/Space 100/100 micron and Via/Land is 200/400 microns. ALIVH-G technology makes a lightweight substrate (less than 100g) The paper presents the evaluation conducted to ensure the stability of the laminate and microvias through the double-sided lead free reflow process. This was evaluated as a part of the phone product qualification.
机译:迁移到无铅回流是为PCB行业带来了许多挑战。高TG层压板,材料稳定性通过2X回流,返工,湿度敏感性等。这需要仔细评估新的层压材料,平衡部件布局和回流型材的优化,以最大限度地减少对PWB的损坏。这对于用于手机和其他便携式产品的薄PWB(少于0.1毫米)板至关重要。使用搭建Microvia Technologies的其他便携产品。功能增加的趋势和便携式无线产品(如手机)的尺寸减少; PDA要求增加印刷电路板的路由密度。手持式无线产品市场需求产品小,薄,低成本和轻量级和改进的用户界面。此外,掌上无线电话与掌上电脑和互联网设备的融合正在加速对设计具有最小,低成本技术的功能电路的需求。从历史上看,该行业通过高密度互连技术和增加的硅集成和组件小型化遇到了这一挑战。 Microvia高密度互连(HDI)也称为Build Up技术,是一种构造具有高路由密度需求的电路板的方法。 [1]。对于HDI板,可以使用未原始的电介质如树脂涂覆的箔(RCF)来形成通孔,使用诸如激光钻孔或光敏的加工技术。然后使用无电铜/电解电镀金属化通孔。 HDI结构的优点是能够创建较小的通孔(6密耳)和焊盘尺寸。与传统板相比,这使得能够更高的路由密度,较低的金属计数,降低的板面积和增加的功能。 HDI通过在外层中使用累积微米来改善布线密度。然而,仍有静止空间,因为通过孔结构交错,不能安装部件而无法接线。另一方面,Alivh-g(任何层间隙通孔)不需要通孔。这是因为任何两层通过IVH(间隙通孔)电连接。 IVH可以放置在任何位置。由于仅仅是不通过孔的孔来扰乱部件之间的互连,因此死区变化,并且布线能力大大提高。 [2]过去的电路板技术在外层上使用堆叠的微宽度。目前的电路板设计使用Alivh-G技术。这些通孔是激光钻孔,使用的互连技术是导电铜浆料。典型的设计规则是线/空间100/100微米和VIA / Land是200/400微米。 Alivh-G技术使轻量级基板(小于100g)纸张呈现了通过双面无铅回流过程确保层压板和微潜水的稳定性。这被评估为手机产品资格的一部分。

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