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Surface Diffusion and Incorporation Process of Adatom in Fe-Al Multilayer System

机译:Fe-Al多层系统中Adatom的表面扩散和掺入过程

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Using the ab initio pseudopotential calculations, the surface diffusion and incorporation process at the interface of Fe-Al multilayer system were quantitatively investigated. The hollow site was most stable adsorption site on both Al (001) and Fe (001) surface. The adsorption energies were 8.62 eV for Fe/Al (001) and 5.30 eV for Al/Fe (001) system. The calculated energy barriers for the surface diffusion of adatom were 0.89 eV and 0.61 eV for each system. The energy barrier for the incorporation of Fe adatom into the Al substrate was calculated to be 0.38 eV and the energy gain of the system was 0.49 eV. However, the Al adatom required relatively large energy barrier, 0.99 eV for the incorporation into the Fe substrate resulting in 0.13 eV increase in total energy of the system.
机译:使用AB Initio假序计算,定量研究了Fe-Al多层系统界面处的表面扩散和掺入过程。中空部位在Al(001)和Fe(001)表面上是最稳定的吸附位点。对于Al / Fe(001)系统,Fe / Al(001)和5.30eV的吸附能量为8.62eV。用于表面扩散的计算能量屏障为0.89eV和每种系统的0.61eV。将Fe Adatom掺入Al底物中的能量屏障为0.38eV,系统的能量增益为0.49eV。然而,Al Adatom需要相对大的能量屏障,0.99eV用于掺入Fe底物中,导致系统的总能量增加0.13eV。

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