首页> 外文期刊>Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films >ARXPS investigation of diffusion as a limiting process in the incorporation of adatoms into polystyrene surfaces treated by nitrogen plasmas
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ARXPS investigation of diffusion as a limiting process in the incorporation of adatoms into polystyrene surfaces treated by nitrogen plasmas

机译:ARXPS研究扩散作为氮原子处理过的将原子结合到聚苯乙烯表面中的限制过程

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Polystyrene films were exposed to nitrogen plasmas for periods up to 4 min. ARXPS measurements revealed the presence of oxygen and nitrogen in the surface because of the plasma treatment. The depth profiles of these adatoms were determined by fitting a Thomas-Windle model profile to the data. As found previously, the best-fit depth profiles resembled a step function, consistent with case II diffusion. However, the depth of penetration of the adatom species into the polymer surface was not found to vary with plasma duration, which is inconsistent with Case II diffusion, and provides evidence that diffusion processes do not limit the loading of adatom species into the surface during nitrogen plasma treatment. A possible reason for the generation of erroneous step function depth profiles is discussed. Copyright (c) 2007 John Wiley & Sons, Ltd.
机译:将聚苯乙烯薄膜暴露于氮等离子体下长达4分钟。 ARXPS测量表明由于进行了等离子体处理,表面中存在氧气和氮气。通过将Thomas-Windle模型轮廓拟合到数据来确定这些吸附原子的深度轮廓。如前所述,最合适的深度剖面类似于阶跃函数,与案例II的扩散一致。然而,未发现吸附原子渗透到聚合物表面的深度随等离子体持续时间而变化,这与案例II的扩散不一致,并提供了扩散过程并不限制氮气中吸附原子进入表面的负载的证据。等离子处理。讨论了产生错误的阶梯函数深度分布图的可能原因。版权所有(c)2007 John Wiley&Sons,Ltd.

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