首页> 外文会议>Test Measurement Conference >A Metrology Approach for the Monitoring of EDX Silicon Detector Performance
【24h】

A Metrology Approach for the Monitoring of EDX Silicon Detector Performance

机译:EDX硅探测器性能监测的计量方法

获取原文

摘要

Energy dispersive X-ray spectroscopy (EDX) is a routine non-destructive analytical tool for elemental analysis of materials on a micrometer scale and therefore falls into the measurement of amount of substance in the field of chemical metrology as specified under the ISO guidelines. The ISO 17025 accreditation procedure for any laboratory requires the identification and classification of the sources of uncertainty for all analysis techniques such as EDX applied within the laboratory. For the EDX technique this includes the monitoring of the detector performance parameters such as resolution. The ISO 15632 standard deals with the measurement of the semiconductor detector resolution using the full width half maximum (FWHM) of the MnK(alpha) X-ray peak. The operating conditions for the measurement of detector resolution is specified for an x-ray input count rate of 1 000cps and a minimum peak intensity of 10 000 counts. There are, however, two major disadvantages for the ISO 15632 standard. Firstly, there is no statistical foundation for the optimum resolution measurement specifications. Secondly there are no official guidelines for setting up of quality control charts for the monitoring of the detector resolution. The establishment of statistical control charts will require the EDX operator to monitor the detector resolution on the microscope column under precise and repeatable measurement conditions at regular time intervals over an extended period. It is therefore necessary to determine the optimum conditions for the measurement of the detector resolution as a function of the acquisition parameters. In this study we report the results for the resolution measurement for the MnK(alpha) peak as a function of spectrum acquisition live time and pulse processor time constant. Secondly we present results for the establishment of statistical control charts by the application of two statistical sampling strategies, e.g. CUSUM and Shewhart, for the monitoring of the detector resolution.
机译:能量分散X射线光谱(EDX)是用于微米级材料的元素分析的常规非破坏性分析工具,因此在ISO指南下规定的化学计量领域的物质量的测量下降。任何实验室的ISO 17025认证程序需要识别和分类所有分析技术的不确定来源,例如在实验室内应用的EDX。对于EDX技术,这包括监视检测器性能参数,例如分辨率。 ISO 15632标准使用MNK(α)X射线峰的全宽半最大(FWHM)测量半导体检测器分辨率。为探测器分辨率测量的操作条件指定为X射线输入计数率为1 000cps,最小峰强度为10 000计数。然而,ISO 15632标准的两个主要缺点。首先,最佳分辨率测量规范没有统计基础。其次,没有官方指南,用于建立质量控制图表,以监测探测器分辨率。统计控制图的建立将需要EDX操作员在较长时段的规则间隔下在精确和可重复的测量条件下监视显微镜柱上的检测器分辨率。因此,需要确定作为采集参数的函数的检测器分辨率测量的最佳条件。在这项研究中,我们报告了MNK(alpha)峰值的分辨率测量结果作为频谱采集实时时间和脉冲处理器时间常数的函数。其次,我们通过应用两种统计抽样策略,提出建立统计控制图表的结果,例如, Cusum和Shewhart,用于监测探测器分辨率。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号