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Electrochemical tailoring and optical investigation of advanced refractive index profiles in porous silicon layers

机译:多孔硅层中高级折射率分布的电化学修整和光学研究

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Porosity depth profiles with exponential or sinusoidal shape were fabricated electrochemically in crystalline silicon using time-variable current densities and studied employing variable angle spectroscopic ellipsometry. Since volume porosity in porous silicon depends on the current density, it was possible to electrochemically tailor porosity depth profiles, which in a first approximation resembled the time modulation of the applied current. Optical characterization of the samples were realized using multilayer optical models and the Bruggeman effective medium approximation allowing variations of the index of refraction according to the applied current density profiles. The analysis also revealed deviations from desired profiles in terms of in-depth inhomogeneities.
机译:使用随时间变化的电流密度在晶体硅中电化学制造具有指数或正弦形状的孔隙深度分布图,并使用变角光谱椭圆仪进行研究。由于多孔硅中的体积孔隙率取决于电流密度,因此可以通过电化学方式调整孔隙率深度分布,该分布在第一近似中类似于所施加电流的时间调制。使用多层光学模型和Bruggeman有效介质近似实现了样品的光学表征,Bruggeman有效介质近似允许根据所施加的电流密度曲线改变折射率。分析还显示在深度不均匀性方面偏离了所需的轮廓。

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