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Noise assessment of AlGaN/GaN HEMTs on Si or SiC substrates: application to X-band low noise amplifiers

机译:Si或SiC基板上AlGaN / GaN Hemts的噪声评估:在X波段低噪声放大器应用

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This study regards the low noise properties of X-band GaN-based LNAs as well as its associated robustness. Devices are processed on epilayers grown on SiC or Si substrates. The HEMTs present very low noise properties with NF/sub min/ and G/sub ass/ close to 1 dB and 13 dB at 12 GHz. The robustness tests show that the component withstands power level up to 34 dBm. A two-stages X-band LNA is fabricated showing a noise figure of 1.7 dB with a gain of 20 dB at 10 GHz.
机译:本研究至于X波段GaN的LNA的低噪声性能以及其相关的鲁棒性。在SiC或Si基板上生长的脱膜上处理装置。 HEMTS在12 GHz下呈现NF / SUM MIN / SUM AS /接近1 dB和13dB的非常低的噪声性能。稳健性测试表明,该组件可承受高达34 dBm的功率水平。制造双阶段X频带LNA,显示出1.7 dB的噪声系数,增益为20dB为10GHz。

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