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Effects of film thickness and W content on structure and magnetic anisotropy of Co-W films

机译:薄膜厚度和W含量对CO-W薄膜结构和磁各向异性的影响

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摘要

Co-W magnetic films attracted much interest as one of the candidates for high-density magnetic recording media. In this study, Co-W epitaxial films with various thicknesses and different contents were prepared, and the effects of thickness and content on structure and magnetic anisotropy were investigated. Co_{100-x}W_{x} (x=0, 6, 10, 16) magnetic films (Thickness: 5-50nm) were deposited on MgO (111) single crystal by using DC magnetron sputtering system at 300 deg C. Ru (20nm) films were used as buffer layers. The Ar pressure during sputtering was 5 mTorr. Structure characterization of the films was examined by X-ray diffraction (XRD). Magnetic anisotropy was determined by the magnetization curves measured with a Vibrating sample magnetometer (VSM).
机译:CO-W磁性薄膜吸引了许多兴趣,作为高密度磁记录介质的候选者之一。在该研究中,制备了具有各种厚度和不同内容物的CO-W外延膜,研究了厚度和含量对结构和磁各向异性的影响。通过在300℃下使用DC磁控溅射系统沉积在MgO(111)单晶上沉积磁膜(X = 0,6,10,16)磁膜(厚度:5-50nm)。 Ru(20nm)薄膜用作缓冲层。溅射期间的Ar压力为5毫托。通过X射线衍射(XRD)检查膜的结构表征。通过用振动样品磁力计(VSM)测量的磁化曲线确定磁各向异性。

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