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GiAXD and XPS Characterization of sp~3C Doped SiC Superhard Nanocomposite Film

机译:GIAXD和SP〜3C掺杂SiC超硬纳米复合膜的XPS表征

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The sp~3C doped SiC superhard nanocomposite films had been deposited on stainless steel (SS) substrates at different temperature by electron beam-physical vapor deposition (EB-PVD). The sp~3C doped SiC film was studied by grazing incidence X-ray asymmetry diffraction (GIAXD), and X-ray photoelectron spectroscopy (XPS). The results of GIAXD showed that the sp~3C doped SiC nanocomposite films were not a perfect crystal, which was composed with fine SiC nanocrystals, and a second phase very similar to diamond like carbon (DLC). XPS analysis showed that the excess C existed in the present films changed from diamond into DLC structure from the surface to inner of the films.
机译:通过电子束物理气相沉积(EB-PVD),在不同温度下沉积在不同温度下的不锈钢(SS)基板上沉积SP〜3C掺杂的SiC超硬型膜。通过放牧入射X射线不对称衍射(GiaxD)和X射线光电子体光谱(XPS)来研究SP〜3C掺杂SiC膜。 Giaxd的结果表明,SP〜3C掺杂的SiC纳米复合膜不是完美的晶体,其用细SiC纳米晶体组成,第二相与碳(DLC)非常相似。 XPS分析表明,本发明薄膜中存在的多余C从金刚石变为从薄膜内部的DLC结构变为DLC结构。

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