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An Investigation of Structure and Wear Properties of TiN/NbN Films Deposited by Reactive Magnetron Sputtering

机译:反应磁控溅射沉积锡/ NBN薄膜结构和磨损性能研究

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TiN/NbN multilayers on steel substrates (SKD11) are produced using DC magnetron sputtering process. The multilayer obtained are characterized in composition by means of X-ray diffraction techniques, Microhardness and adhesion to the substrate were studied by atomic force microscopy and scratch tests. The morphological analysis and coating structure are studied using scanning electron microscopy, and atomic force microscopy. The film thickness is measured by a stylus profiler (XP-2 stylus profiler). Wear tests were performed on pin-on-disk configuration and dry sliding conditions, at 5N load by using hardened steel ball. On mechanical properties, higher Young's modulus and hardness values follow to increase the TiN/NbN layers number. The multilayer films of 64 layers at 500°C lh annealing indicated that the microhardness and Young's modulus had the highest values.
机译:钢基板上的锡/ NBN多层(SKD11)采用DC磁控溅射工艺生产。通过X射线衍射技术,通过原子力显微镜和划痕试验研究了通过X射线衍射技术,微硬度和对基材的粘附性的多层。使用扫描电子显微镜和原子力显微镜研究了形态学分析和涂层结构。膜厚度通过触控笔分析器(XP-2触控笔分析器)测量。通过使用硬化的钢球,在5N负载下对磁盘上配置和干滑动条件进行磨损试验。关于机械性能,较高的杨氏模量和硬度值遵循以增加锡/ NBN层数。 500℃的64层的多层膜在500℃的退火上表明,微硬度和杨氏模量具有最高值。

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